Korea Advanced Institute of Science and Technology · Engineering
Sung-Yool Choi 교수의 연구실은 2차원 물질 기반의 초박막 광전자 소자와 신재생 에너지 응용 소재를 중심으로 연구를 진행하고 있습니다. 특히, 웨이퍼 스케일의 대면적 2차원 이종구조(예: WSe₂/MoS₂)를 활용한 고감도 광검출기 및 고성능 투명 전도성 전극 개발에 주력하고 있으며, 유연성과 고성능을 동시에 확보하는 데 초점을 맞추고 있습니다. 또한, 그래핀 옥사이드 기반 저항성 메모리 및 폴리머 기반 유연 메모리스위치를 통한 뉴로모픽 소자 기술 개발을 통해 차세대 인공지능 하드웨어의 핵심 소재를 모색하고 있습니다.
Figures are computed from collected data and may differ slightly.
Band engineering using the van der Waals heterostructure of two-dimensional materials allows for the realization of high-performance optoelectronic devices by providing an ultrathin and uniform PN junction with sharp band edges. In this study, a highly sensitive photodetector based on the van der Waals heterostructure of WSe<sub>2</sub> and MoS<sub>2</sub> was developed. The MoS<sub>2</sub> was utilized as the channel for a phototransistor, whereas the WSe<sub>2</sub>-MoS<sub>2</sub> PN junction
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As the need for super-high-resolution displays with various form factors has increased, it has become necessary to produce high-performance thin-film transistors (TFTs) that enable faster switching and higher current driving of each pixel in the display. Over the past few decades, hydrogenated amorphous silicon (a-Si:H) has been widely utilized as a TFT channel material. More recently, to meet the requirement of new types of displays such as organic light-emitting diode displays, and also to ove
Abstract Graphene produced by chemical vapor deposition (CVD) has attracted great interest as a transparent conducting material, due to its extraordinary characteristics such as flexibility, optical transparency, and high conductivity, especially in next‐generation displays. Graphene‐based novel electrodes have the potential to satisfy the important factors for high‐performance flexible organic light‐emitting diodes (OLEDs) in terms of sheet resistance, transmittance, work function, and surface
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A method of graphene transfer without metal etching is developed to minimize the contamination of graphene in the transfer process and to endow the transfer process with a greater degree of freedom. The method involves direct delamination of single-layer graphene from a growth substrate, resulting in transferred graphene with nearly zero Dirac voltage due to the absence of residues that would originate from metal etching. Several demonstrations are also presented to show the high degree of freed
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