Min-Hyuk Lim
Ulsan National Institute of Science and Technology · Materials Science
About the Lab
Professor Min-Hyuk Lim's research lab specializes in the development of novel metal-organic precursors for atomic layer deposition (ALD) and metal-organic chemical vapor deposition (MOCVD) of high-quality oxide thin films. The lab focuses on designing and synthesizing heteroleptic transition metal alkoxides—particularly titanium-based complexes with tailored ligands—to achieve precise control over film composition, growth kinetics, and crystallinity. Their work targets applications in advanced electronic, photonic, and catalytic devices, emphasizing materials for next-generation semiconductors and energy-related technologies.
Research Overview
Research Output Trend
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Selected Papers
2Heteroleptic titanium alkoxides with three different ligands, <italic>i.e.</italic>, [Ti(O<sup>i</sup>Pr)(X)(Y)] (X = tridentate, Y = bidentate ligands), were synthesized to find efficient metal organic chemical vapor deposition (MOCVD) precursors for TiO<sub>2</sub> thin films.
Research Areas
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