The University of Tokyo · Engineering
Professor Madoka Takai's research lab specializes in advanced materials synthesis and surface engineering, with a focus on plasma-based thin film deposition, functional polymer interfaces, and soft magnetic materials for next-generation electronic and biomedical devices. The lab investigates the fundamental mechanisms of plasma processes—particularly in silane-based plasmas—while developing innovative surface modifications to control electrokinetic phenomena and protein interactions. Another key direction involves electrodeposited magnetic films with tailored nanostructures and magnetic properties for high-performance data storage applications. The integration of materials science, surface chemistry, and device functionality defines the lab’s interdisciplinary approach.
Figures are computed from collected data and may differ slightly.
Electron temperature measured by an optical-emission spectroscopy shows a strong substrate temperature dependence in a silane glow-discharge plasma. The electron temperature increases with time after turning on the plasma at a low substrate temperature of 150 °C, while it stays constant at a high substrate temperature of 400 °C. The electron temperature is drastically reduced when the source gas silane is diluted with hydrogen at low substrate temperatures. These results suggest that the electro
A type of charged phospholipid polymer biointerface was constructed on a quartz microfluidic chip to control the electroosmotic flow (EOF) and to suppress non-specific protein adsorption through one-step modification. A negatively charged phospholipid copolymer containing 2-methacryloyloxyethyl phosphorylcholine (MPC), n-butyl methacrylate (BMA), potassium 3-methacryloyloxypropyl sulfonate (PMPS) and 3-methacryloxypropyl trimethoxysilane (MPTMSi) moieties (referred to as PMBSSi) was synthesized
A soft magnetic CoNiFeS film as a write head core material for the next generation was prepared by electrodeposition. In this system, thiourea was used as an additive in the CoNiFe ternary alloy plating bath. The most suitable magnetic properties were obtained at the film composition of [atomic percent (a/o)] with a high saturation magnetic flux density of 1.7 T, a high resistivity (ρ) of 51 μΩ cm, and a low saturation magnetostriction (λs) of . The film consisted of fine minute crystal grains 5
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