[论文解读] NASICON solid-electrolyte modification and analysis using ion and neutron beams

Giovanni Ceccio, J. Vacı́k+8 more|arXiv (Cornell University)|Jan 22, 2026

Advanced Battery Materials and Technologies被引用 0

一句话总结

该论文报道了通过从固相合成的压片进行溅射制备NASICON纳米薄膜，随后进行Ni离子注入和电化学阻抗谱研究以研究辐照对电性属性的影响。

ABSTRACT

Solid electrolytes (SEs) for sodium-based superionic conductors (NaSICON) are widely recognized for their excellent ionic conductivity and application in sodium based energy storage systems. While considerable effort has been made to develop thin electrolytes for all-solid-state batteries (ASSBs) for lithium ions, only a few sodium-based SEs have been successfully fabricated as thin films. These thin films are particularly desirable for their reduced electrical resistance, which typically increases with the thickness of the SE. By reducing the thickness of the SEs to the nanometer scale, their ionic conductivity can be significantly enhanced. In this study, the NASICON composite was initially prepared in the form of pellets using the mixed oxide technique with a planetary ball mill and synthesized by the solid-state method at 1250 °C. The resulting pellets were used as sputtering targets in a low-energy ion facility to prepare continuous and uniform NASICON nanofilms. To explore the effect of ion implantation on the electrical properties of NASICON, the prepared films were bombarded with Ni ions at 1.1 MeV and varying fluences, using the Tandetron accelerator at the CANAM infrastructure (NPI Řež). The electrical properties of both the synthesized and implanted films were analyzed through electrochemical impedance spectroscopy (EIS). The results, describing the impact of irradiation on NASICON's properties, are presented here.

研究动机与目标

• 将NASICON固态电解质厚度缩小到纳米尺度对离子传导的影响进行研究。
• 通过从固相合成颗粒进行溅射制备NASICON纳米薄膜。
• 利用阻抗谱研究Ni离子注入对NASICON电性属性的影响。
• 评估离子辐照后电化学性能的变化。

提出的方法

• 通过混合氧化物法在1250 °C进行固相合成制备NASICON压片。
• 将压片用作溅射靶材，沉积连续的NASICON纳米薄膜。
• 在Tandetron加速器上以1.1 MeV对薄膜进行不同通量的Ni离子轰击。
• 用电化学阻抗谱(EIS)分析所合成及注入后薄膜的电性属性。

实验结果

研究问题

• RQ1 与块状压片相比，纳米尺度NASICON薄膜的制备如何影响离子传导？
• RQ2 Ni离子注入对NASICON薄膜电学特性的影响是什么？
• RQ3 EIS能否量化辐照引起的NASICON电性变化？
• RQ4 哪些辐照参数能优化或降解NASICON的性能？

主要发现

• Ni离子注入和辐照参数被研究并通过EIS表征其对NASICON电性属性的影响。
• 研究结果描述了辐照对NASICON性质的影响。
• 展示了连续薄膜形式的NASICON制备及随后的辐照过程。
• 使用EIS将离子注入引起的结构变化与阻抗变化相关联。
• NASICON复合材料在高温固相合成中制备，进一步加工成纳米薄膜以便分析。