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Jss6456

Korea Advanced Institute of Science and Technology · Engineering

About the Lab

Professor Jss6456's research lab specializes in advanced magnetic and microfabrication technologies, focusing on the design and optimization of permanent magnet linear actuators for high-efficiency electromechanical systems. The lab also conducts cutting-edge research in plasma etching processes for high-aspect-ratio semiconductor device fabrication, particularly in selective SiO2 etching and sidewall profile control. Additionally, the lab explores materials and device physics related to magnetic tunnel junctions and MgO-based barriers for next-generation magnetic random access memory (MRAM) applications.

linear actuatorsplasma etchingMgO-based MTJMRAMhigh-aspect-ratio etching

Research Overview

Papers
10
Total Citations
31
Papers (5y)
7
Primary Field
Engineering

Research Output Trend

Figures are computed from collected data and may differ slightly.

Publications per year (5y)
7total
2000
2010
2011
2013
2021
Citations per year (5y)
31total
20002010201120132021

Selected Papers

10
1
Article|16 citations·2021
Optimal Design of Short-Stroke Linear Oscillating Actuator for Minimization of Side Force Using Response Surface Methodology
Woo-Hyeon Kim, Chang-Woo Kim, Hyo-Seob Shin, Sang-Sup Jeong, Jang-Young Choi
SJR Q2IEEE Transactions on Magnetics

Permanent magnet (PM)-type linear oscillating actuators (LOAs) are used in various types of equipment owing to their high efficiency, thrust density, and good control performance. However, the disadvantage of the LOA is the side force inevitably generated by the magnetic coupling structure of the stator and the PM mover. Therefore, side force reduction is essential at the design stage. This study manages the optimal side force design of a movable PM-type linear actuator using response surface me

Electrical and Electronic EngineeringEngineering
2
Article|11 citations·2000
Effects of fluorocarbon polymer deposition on the selective etching of SiO2/photoresist in high density plasma
Changwoong Chu, Taehyuk Ahn, Jisoo Kim, Sang-Sup Jeong, Joo-Tae Moon
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

A new periodic two-step process composing SiO2 etching with high bias radio frequency (rf) power and fluorocarbon deposition with low bias rf power was studied for the highly selective etching of SiO2 to photoresist (PR). In this experiment, the time scale of each step is longer than the conventional time-modulation technique in order to maximize the protection layer on PR and prevent the etch stop. Many works have focused on the gaseous chemical species especially CF2 radicals for selective sur

Electrical and Electronic EngineeringEngineering
3
Article|2 citations·2011
Isolation Trench Etch Process Using Pulsed RF Bias Power in HBr/CF4/O2 Plasma
Inho Park, Yung Seung Kang, Sang-Sup Jeong, Seok Woo Nam
ECS Transactions

Abrupt changes in sidewall profile were induced in pulsed plasma etch process for high aspect ratio isolation trench structuring. Impacts of operational parameters when applying pulsed RF bias power were investigated. Silicon sidewall chipping problems were removed mainly by increasing bias power level and pulse frequency. The chemical sensitivity of O2 has shown decreased in extremely narrow trench spaces of high pattern density

Electrical and Electronic EngineeringEngineering
4
Article|1 citations·2013
Study of ion beam damage in magnetic tunnel junction on FIB prepared samples
Kwangho Park, Cheol‐Woong Yang, Kyuchul Kim, Dong Woo Nam, Kyuman Hwang, Junsoo Bae, Juhyeon Ahn, Jin Hwak Choi, Soon-Oh Park, Sang-Sup Jeong, Han-Ku Cho, Eunseung Jeong
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Magnetic Random Access Memory (MRAM) has emerged as the leading candidate for future universal memory due to its non-volatility, excellent endurance and read/write performance. The magnetic tunnel junction (MTJ) is a data storage element in MRAM and is basically composed of two ferromagnetic layers separated by the magnesium oxide (MgO) tunnel barrier. MgO between two ferromagnetic layers was adopted to enlarge the resistance difference between two kinds of magnetic arrangements by tunneling cur

Atomic and Molecular Physics, and OpticsPhysics and Astronomy
5
Article|1 citations·2010
Matrix Scoring Method for the Evaluation of TSV Development Using a Magnetically Enhanced Plasma Etcher
Kyounghoon Han, Yong-Hee Choi, Chulho Shin, Sang-Sup Jeong, Sung-hee Youn, Koji Maruyama
ECS Meeting AbstractsOA

Abstract not Available.

Electronic, Optical and Magnetic MaterialsMaterials Science
7
Article|0 citations·1994
Temperature-dependent photoacoustic measurements of the structural transformation of VPI-5 to AlPO4-8
Sang-Sup Jeong, Hakze Chon
Microporous Materials
Polymers and PlasticsMaterials Science
8
Article|0 citations·2010
Improvement of Photoresist selectivity during etching silicon oxynitride using SF6 gas
Namgun Kim, Sung‐Il Cho, Chulho Shin, Sang-Sup Jeong, Seok-Woo Nam
Bulletin of the American Physical Society
Electrical and Electronic EngineeringEngineering
9
Article|0 citations·2011
Isolation Trench Etch Process Using Pulsed RF Bias Power in HBr/CF4/O2 Plasma
Inho Park, Yung Seung Kang, Sang-Sup Jeong, Seok Woo Nam
ECS Meeting AbstractsOA

Abstract not Available.

Mechanics of MaterialsEngineering

Research Areas

Electrical and Electronic EngineeringAtomic and Molecular Physics, and OpticsElectronic, Optical and Magnetic MaterialsBioengineeringMechanics of MaterialsInorganic Chemistry

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