Byung‐Gook Park
서울대학교 전기정보공학부 · 공학
Byung-Gook Park 교수의 연구실은 반도체 메모리 소자 및 저전력 전자소자에 초점을 맞춘 나노전자 연구를 수행하고 있습니다. 특히, SiN 기반 저항성 메모리와 TFET를 활용한 초저전력 스위칭 소자 설계 및 최적화에 대한 기초 연구를 진행하며, 고성능 및 고신뢰성 소자 구현을 목표로 합니다. 전산 시뮬레이션과 실리콘 기반 CMOS 공정 통합을 기반으로 한 소자 구조 설계가 핵심입니다.
표시된 성과는 수집된 데이터 기준으로 산출되며, 일부 차이가 있을 수 있습니다.
SiN <sub>x</sub> -based nano-structure resistive memory is fabricated by fully silicon CMOS compatible process integration including particularly designed anisotropic etching for the construction of a nano-cone silicon bottom electrode (BE). Bipolar resistive switching characteristics have significantly reduced switching current and voltage and are demonstrated in a nano-cone BE structure, as compared with those in a flat BE one. We have verified by systematic device simulations that the main ca
In order to overcome the small current drivability of a tunneling field-effect transistor (TFET), we have introduced a TFET with the SiGe body and elevated Si drain region. The proposed TFET features large on-current and lower subthreshold swing (SS) compared with the Si TFET. Also, by using elevated Si drain region, it is expected that ambipolar current can be suppressed. Through the technology computer aided design (TCAD) simulation, the characteristics of the proposed TFET have been investiga
Spiking neural networks (SNNs) have attracted many researchers' interests due to its biological plausibility and event-driven characteristic. In particular, recently, many studies on high-performance SNNs comparable to the conventional analog-valued neural networks (ANNs) have been reported by converting weights trained from ANNs into SNNs. However, unlike ANNs, SNNs have an inherent latency that is required to reach the best performance because of differences in operations of neuron. In SNNs, n
Here we demonstrate low-power resistive switching in a Ni/SiN<sub>y</sub>/SiN<sub>x</sub>/p<sup>++</sup>-Si device by proposing a double-layered structure (SiN<sub>y</sub>/SiN<sub>x</sub>), where the two SiN layers have different trap densities. The LRS was measured to be as low as 1 nA at a voltage of 1 V, because the SiN<sub>x</sub> layer maintains insulating properties for the LRS. The single-layered device suffers from uncontrollability of the conducting path, accompanied by the inherent ran