염익태 교수

Direct current magnetron discharge sources are often characterized by current-voltage characteristics of the form I∝V n where n is typically in the range from 4 to 10. Similar I-V characteristics are found for dc hollow cathode discharges where the cathode configuration effectively provides electrostatic confinement of the primary electrons. Therefore, by analogy, it has been suggested that the exponent n provides an index to the effectiveness of the magnetic electron confinement in a magnetron

When a steady-state capacitive rf discharge is sustained between two electrodes whose surfaces in contact with the plasma have different areas, a negative dc self-bias usually develops on the smaller electrode. For ratios of electrode areas greater than about three, the self-bias is typically 80%–90% of the zero-to-peak potential of the applied rf voltage. However, in cylindrical-post magnetron discharges which are driven by rf power, the self-bias is often only 10%–20% of the zero-to-peak appli

The etching properties of C₆F₆/Ar/O₂ in both an inductively coupled plasma (ICP) system and a capacitively coupled plasma (CCP) system were evaluated to investigate the effects of high C/F ratio of perfluorocarbon (PFC) gas on the etch characteristics of SiO₂. When the SiO₂ masked with ACL was etched with C₆F₆, for the CCP system, even though the etch selectivity was very high (20 ~ infinite), due to the heavy-ion bomba

In the present study, an attempt has been made to treat dairy wastewater entirely via anaerobic treatment over a period of 215 days, using two-stage Hybrid Upflow Anaerobic Sludge Blanket (HUASB) reactors, which offer the advantages associated both with fixed film and upflow sludge blanket treatments. A HUASB with polyurethane foam cubes was used for stage I, and a HUASB utilizing PVC-cut rings was used for stage II. The output from stage I was used as the input for stage II. The two-stage react