Joon Hyung Shim 교수

Yttria-stabilized zirconia (YSZ) films were synthesized by atomic layer deposition (ALD). Tetrakis(dimethylamido)zirconium and tris(methylcyclopentadienyl)yttrium were used as ALD precursors with distilled water as oxidant. From X-ray photoelectron spectroscopy (XPS) compositional analysis, the yttria content was identified to increase proportionally to the pulse ratio of Y/Zr. Accordingly, the target stoichiometry ZrO2/Y2O3 = 0.92:0.08 was achieved. Crystal and grain structures of ALD YSZ films

Structural and microstructural properties as well as the fuel cell performance of anhydrous proton conducting yttria-doped barium zirconate (BYZ) membranes were investigated. The membranes were nominally about 100 nm thick and were fabricated by both atomic layer deposition (ALD) and pulsed laser deposition (PLD) techniques on micromachined Si substrates. Electrochemical cells (H2, Pt/BYZ/Pt, air) were fabricated using porous platinum electrodes deposited by sputtering. The cells were tested in

This feature article provides a progress review of atomic layer deposition (ALD) for fabrication of oxide-ion as well as proton conducting ceramic fuel cells. A comprehensive analysis of structural, chemical, surface kinetics, and electrochemical characterization results of ALD membranes is also presented. ALD is a surface reaction limited method of depositing conformal, high quality, pinhole-free, uniform thickness nanofilms onto planar or three-dimensional structures. Deposition by one atomic

The thinning strategy is effective to develop high-performance solid oxide fuel cells (SOFCs) that can operate at low temperatures. The inkjet printing, which enables precise thin-film production in a simple and cost-effective manner, can have an important role in the implementation of the thin-film SOFC technology. In this study, a method to manufacture the entire SOFC using a low-cost commercial inkjet printer is proposed. All the developed ceramic inks exhibited long-term dispersion stabiliti

This review addresses recent approaches for atomic layer deposition (ALD) that are closely related to the electrical properties of ultrathin SrTiO₃ and BaTiO₃ films.

Abstract Atomic layer deposition (ALD) is a powerful tool for nanoscale film deposition. It can uniformly deposit films at a monolayer level even in complex 3D structures, while the deposition temperature is relatively low with its potential scalability. In this work, surface tuning of solid oxide fuel cell (SOFC) cathodes is successfully demonstrated by modifying the surface of La 0.6 Sr 0.4 Co 0.2 Fe 0.8 O 3− δ (LSCF) with nanoscale lanthanum strontium cobaltite (LSC) using ALD. The ALD‐LSC su

The proton conductivity of yttrium-doped barium zirconate (BYZ) films epitaxially grown on MgO(100) has been studied in the range of 140–290°C as a function of film thickness (60–670nm) in relation to their crystal and morphological structure at the nanoscale. Highly textured 60nm BYZ film epitaxially grown on MgO(100) showed high ionic conductivity, close to its bulk value. In contrast, thicker polycrystalline samples with rougher surfaces, caused by grain boundary formation, exhibited lower co

We tested the atomic layer deposition of platinum layers onto various sputtered porous metals including silver, palladium, ruthenium, and gold as catalysts for solid oxide fuel cells. We investigated thermal and chemical stability against oxidation using X-ray photoelectron spectroscopy. Fuel cell tests were conducted using the metal-atomic layer deposition platinum cathodes with thick, 8% yttria-stabilized zirconia electrolytes and sputtered platinum anodes. Performance of the fuel cells was me