京都大学 · 医学
Hiroki Tanaka教授の研究室では、極端紫外線(EUV)光源としてのCO2レーザー誘起プラズマの基礎的特性と応用を研究しています。特に、スモールスケールのEUV光源としてのCO2レーザーを用いたスニンクターサイズの高効率プラズマ光源の開発が主な研究テーマです。また、ナノスケールの材料とプラズマの相互作用や、次世代リソグラフィー技術への応用も視野に入れた研究が進められています。
Figures are computed from collected data and may differ slightly.
The direct comparison of the emission characteristics of an extreme ultraviolet (EUV) light between the CO2 and the Nd:YAG laser-produced plasmas (LPP) with a solid tin target is reported. In the case of the Nd:YAG LPP, the conversion efficiency (C.E.) peaked at a laser intensity of about 5×1010W∕cm2 and decreased at higher laser intensity. In the case of the CO2 LPP, the C.E. monotonically increased up to 2×1010W∕cm2, where the C.E. is comparable to the maximum C.E. of the Nd:YAG LPP. The spect
The reaction rates (r(NH(4) (+) ) and r(NO(2) (-) )) in the two-step nitrification reaction were measured in a fluidized-sand-bed biofilm reactor under a range of steady-state conditions with respect to bulk NH(4) (+), NO(2) (-), and O(2) concentrations. It was shown from theory and experiment that under low NH(4) (+) concentration conditions, if the O(2)/NH(4) (+) concentration ratio in the bulk liquid is less than the stoichiometric coefficient (3.4 mg/mg), then oxygen will be rate limiting. I
We propose a CO 2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO 2 laser (4 J, 50 ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than
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