Kyung Hee University · 工学
Professor Hong-Sub Lee's research lab specializes in advanced resistive switching materials and devices for next-generation neuromorphic computing and non-volatile memory applications. The lab focuses on designing and fabricating high-performance memristors and memtransistors using oxide semiconductors, perovskite manganites, and 2D materials, with an emphasis on gate tunability, reliability, and scalability. Key research directions include atomic layer deposition of doped oxide thin films, understanding the role of ionic migration and electronic correlations in resistive switching, and developing novel heterostructures to suppress crosstalk and enhance device performance. The lab also investigates the fundamental mechanisms of resistive switching through advanced spectroscopic and microstructural characterization techniques.
Figures are computed from collected data and may differ slightly.
Abstract Memristive systems offer biomimetic functions that are being actively explored for energy‐efficient neuromorphic circuits. In addition to providing ultimate geometric scaling limits, 2D semiconductors enable unique gate‐tunable responses including the recent realization of hybrid memristor and transistor devices known as memtransistors. In particular, monolayer MoS 2 memtransistors exhibit nonvolatile memristive switching where the resistance of each state is modulated by a gate termina
Resistive random access memory based on the resistive switching phenomenon is emerging as a strong candidate for next generation non-volatile memory. So far, the resistive switching effect has been observed in many transition metal oxides, including strongly correlated ones, such as, cuprate superconductors, colossal magnetoresistant manganites and Mott insulators. However, up to now, no clear evidence of the possible relevance of strong correlation effects in the mechanism of resistive switchin
To implement artificial neural networks (ANNs) based on memristor devices, it is essential to secure the linearity and symmetry in weight update characteristics of the memristor, and reliability in the cycle-to-cycle and device-to-device variations. This study experimentally demonstrated and compared the filamentary and interface-type resistive switching (RS) behaviors of tantalum oxide (Ta<sub>2</sub>O<sub>5</sub> and TaO<sub>2</sub>)-based devices grown by atomic layer deposition (ALD) to prop
Memristors integrated into a crossbar-array architecture (CAA) are promising candidates for nonvolatile memory elements in artificial neural networks. However, the relatively low reliability of memristors coupled with crosstalk and sneak currents in CAAs have limited the realization of the full potential of this technology. Here, high-reliability Na-doped TiO<sub>2</sub> memristors grown in situ by atomic layer deposition (ALD) are demonstrated, where reversible Na migration underlies the resist
A resistive random access memory (ReRAM) based on the memristive effect allows high-density integration through a cross-point array (CPA) structure. However, a significant common drawback of the CPA configuration is the crosstalk between cells. Here, we introduce a solution based on a novel heterojunction stack solely made of members of the perovskite manganite family Pr(1-x)Ca(x)MnO3 (PCMO) and CaMnO(3-δ) (CMO) which show electroforming-free bipolar resistive switching. The heterojunction consi
This study demonstrated that the resistive switching voltage of perovskite manganite material could be controlled by A-site cation substitution in “A” MnO3 perovskite manganite structure. A partial substitution of La3+ in La0.7Sr0.3MnO3 with smaller cation Gd3+ induced A-site vacancy of the largest Sr2+ cation with surface segregation of SrOy due to ionic size mismatch, and the induced vacancies reduced migration energy barrier. The operating voltage decreased from 3.5 V to 2.5 V due to a favora
Ionic memristor devices are crucial for efficient artificial neural network computations in neuromorphic hardware. They excel in multi-bit implementation but face challenges like device reliability and sneak currents in crossbar array architecture (CAA). Interface-type ionic memristors offer low variation, self-rectification, and no forming process, making them suitable for CAA. However, they suffer from slow weight updates and poor retention and endurance. To address these issues, the study dem
Oxide semiconductors and their application in next-generation devices have received a great deal of attention due to their various optical, electric, and magnetic properties. For various applications, an understanding of these properties and their mechanisms is also very important. Various characteristics of these oxides originate from the band structure. In this study, we introduce a band structure analysis technique using a soft X-ray energy source to study a<mml:math xmlns:mml="http://www.w3.
Cross-point array (CPA) structure memories using a memristor are attracting a great deal of attention due to their high density integration with a 4F2 cell. However, a common significant drawback of the CPA configuration is crosstalk between cells. To date, the CPA structure using a redox-based memristor has restrictions to minimize the operating current level due to their resistive switching mechanism. This study demonstrates suitable characteristics of a ferroelectric tunnel junction (FTJ) for
Memristors integrated into a crossbar-array architecture (CAA) are promising candidates for analog in-memory computing accelerators. However, the relatively low reliability of the memristor device and sneak current issues in CAA remain the main obstacles. Alkali ion-based interface-type memristors are promising solutions for implementing highly reliable memristor devices and neuromorphic hardware. This interface-type device benefits from self-rectifying and forming-free resistive switching (RS),
Cross-point memory architecture (CPMA) by using memristors has attracted considerable attention because of its high-density integration. However, a common and significant drawback of the CPMA is related to crosstalk issues between cells by sneak currents. This study demonstrated the sneak current free resistive switching characteristic of a ferroelectric tunnel diode (FTD) memristor for a CPMA by utilizing a novel concept of a ferroelectric quadrangle and triangle barrier switch. A FTD of Au/BaT
This study demonstrates a new resistive switching material, F-doped TiO2 (F:TiO2), fabricated by atomic layer deposition (ALD) with an in-house fluorine source for resistive random access memory (RRAM) devices. Controlling oxygen vacancies is required since RRAM uses resistive switching (RS) characteristics by redistributing oxygen ions in oxide, and poor oxygen defect control has been shown to significantly reduce RRAM reliability. Therefore, this study designed an F based RRAM device using flu
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