Hanyang University · 工学
Professor Jinho Ahn's research lab specializes in advanced materials and thin film technologies for next-generation electronic and energy applications. The lab focuses on atomic layer deposition (ALD)-based materials engineering, particularly for high-k dielectrics, resistive switching oxides, and core-shell nanostructures. Key research directions include the development of nitrogen-doped oxides for reliable MOSFET gate dielectrics, plasmonically enhanced photocatalysts using metal-semiconductor heterostructures, and stable cathode materials for lithium-ion batteries with suppressed cation migration. The lab integrates fundamental materials characterization with device-level performance evaluation to enable durable, high-performance electronic and energy storage systems.
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