Thanh Luan Phan

van der Waals heterostructures (vdWHs) of metallic (m-) and semiconducting (s-) transition-metal dichalcogenides (TMDs) exhibit an ideal metal/semiconductor (M/S) contact in a field-effect transistor. However, in the current two-step chemical vapor deposition process, the synthesis of m-TMD on pregrown s-TMD contaminates the van der Waals (vdW) interface and hinders the doping of s-TMD. Here, NbSe₂/Nb-doped-WSe₂ metal-doped-semiconductor (M/d-S) vdWHs are created via a one-

In this report, a screening-engineered carbon nanotube (CNT) network/MoS₂/metal heterojunction vertical field effect transistor (CNT-VFET) is fabricated for an efficient gate modulation independent of the drain voltage. The gate field in the CNT-VFET transports through the empty space of the CNT network without any screening layer and directly modulates the MoS₂ semiconductor energy band, while the gate field from the Si back gate is mostly screened by the graphene layer. C

We report a black silicon-carbon nanotube (bSi-CNT) hybrid structure for ultrahigh absorbance at wide spectral range of wavelength (300-1200 nm). CNTs are densely grown on entire bSi stems by chemical vapor deposition (CVD) through uniformly coating Fe catalyst. The bSi-CNT not only increases the surface roughness for enhancing the light suppression, but also allows the absorption of light in a wide wavelength range over the Si band gap (>1000 nm owing to 1.1 eV) due to the small band gap of CNT

As the tight contact interface of the lateral PN junction enables high responsivity, specific detectivity, and fast response speed, atomic-scale two-dimensional (2D) lateral PN heterostructures are emerging as viable alternatives to silicon-based photodiodes.

Two-dimensional transition metal dichalcogenides (TMDs) offer numerous advantages over silicon-based application in terms of atomically thin geometry, excellent opto-electrical properties, layer-number dependence, band gap variability, and lack of dangling bonds. The production of high-quality and large-scale TMD films is required with consideration of practical technology. However, the performance of scalable devices is affected by problems such as contamination and patterning arising from devi

The device's integration of molecular electronics is limited regarding the large-scale fabrication of gap electrodes on a molecular scale. The van der Waals integration (vdWI) of a vertically aligned molecular layer (0D) with 2D or 3D electrodes indicates the possibility of device's integration; however, the active junction area of 0D-2D and 0D-3D vdWIs remains at a microscale size. Here, we introduce the robust fabrication of a vertical 1D-0D-1D vdWI device with the ultra-small junction area of

Two-dimensional (2D) van der Waals (vdW) layered transition metal dichalcogenides (TMDs) materials have been receiving a huge interest due to atomically thin thickness, excellent optoelectronic properties, and free dangling bonds. Especially the metallic TMDs, such as MoTe2 (1T’ phase), NbS2, or NbSe2, have shown fascinating physical properties through various applications, such as superconductor and charge density wave. However, carrier transport of metallic TMDs would be degraded due to the po

We report an efficient and controllable method to introduce p-type doping in graphene by decoration with Mn3O4 nanoparticles (NPs) on mechanically exfoliated single layer graphene. A monolayer of Mn3O4 NPs, with a diameter in the range of 5–10 nm, was decorated on a graphene film using an ex-situ method, whereas by controlling the coverage of the NPs on the graphene surface, the carrier concentration could be continually adjusted. The p-type of the NP-decorated single layer graphene was confirme

We demonstrated that manganese-oxide nanoparticles (Mn3O4 NPs) acted as an efficient p-type dopant for graphene. Uniformly-sized were Mn3O4 NPs (~5.5 nm in diameter) were synthesized by using a thermal decomposition method and were decorated on single-layer graphene by using an ex-situ method. The morphology and the bonding status of the NP-decorated graphene were characterized by using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). Mn3O4 clusters with a lateral size o

The interface between oxide/oxide layers shows an inhomogeneous charge transport behavior, which reveals a high conductivity owing to interface-doped. One typical example is the hetero-interface between ZnO film and other wide band gap oxides (e.g., Al2O3, TiO2, and HfO2). It is thus quite evident that the ZnO/other oxides hetero-interface contains high density electron carriers effectively screening the gate-induced electric field. Thus, an extremely weak gate modulation in ZnO film was showed,

Abstract Persistent photoconductivity and optoelectronic synaptic behavior are demonstrated in solution‐processed mesoscopic α‐phase vanadium pentoxide (V 2 O 5 ) thin films. First‐principles simulations coupled with the two‐site Holstein polaron hopping model show that vacancies at the terminal oxygen position lead to long recombination times because photoexcited electrons and holes reside on different layers separated by the van der Waals gap, forming a weakly coupled interlayer exciton polaro

Background The Kirby-Bauer disk diffusion method is a cost-effective and widely used technique for determining antimicrobial susceptibility, suitable for diverse laboratory settings. It involves placing antibiotic disks on a Mueller-Hinton agar plate inoculated with standardized bacteria, leading to inhibition zones after incubation. These zones are manually measured and compared to the Clinical and Laboratory Standards Institute (CLSI) criteria to classify bacteria. However, manual interpretati

Graphene, a two-dimensional (2D) crystal consisting of one layer of carbon atoms, received intense interest in the last few decades due to its rich physics for diverse applications [...]