Thomas Lippert

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTChemical and Spectroscopic Aspects of Polymer Ablation: Special Features and Novel DirectionsThomas Lippert and J. Thomas DickinsonView Author Information Paul Scherrer Institut, 5232 Villigen PSI, Switzerland, and Washington State University, Pullman, Washington 99164-2814 USA Cite this: Chem. Rev. 2003, 103, 2, 453–486Publication Date (Web):January 4, 2003Publication History Received12 August 2002Published online4 January 2003Published inissue 1 Febr

Nanoscale thin films are widely implemented across a plethora of technological and scientific areas, and form the basis for many advancements that have driven human progress, owing to the high degree of functional tunability based on the chemical composition. Pulsed laser deposition is one of the multiple physical vapour deposition routes to fabricate thin films, employing laser energy to eject material from a target in the form of a plasma. A substrate, commonly a single-crystal oxide, is place

Abstract Summary: This work reviews the interaction of photons with polymers with an emphasis on UV laser ablation and surface modification using VUV lamps. Laser ablation of polymers is an established process in industrial applications, but the mechanisms of ablation are still controversial. Different polymers, such as poly(methyl methacrylate), polyimides and specially designed polymers are used as examples to show that the mechanism is a mixture of photochemical and photothermal features whic

Abstract Despite the apparent simplicity of pulsed laser deposition, consistent deposition of thin films with the desired thickness, composition, crystallinity, and quality still remains challenging. This article explores the influence of process parameters with respect to film thickness and composition, two key aspects for thin films which have a very strong effect on film properties, possible applications, and characterization. Using five perovskite materials, a systematic analysis of differen

Many properties of materials can be changed by varying the interatomic distances in the crystal lattice by applying stress. Ideal model systems for investigations are heteroepitaxial thin films where lattice distortions can be induced by the crystallographic mismatch with the substrate. Here we describe an in situ simultaneous diagnostic of growth mode and stress during pulsed laser deposition of oxide thin films. The stress state and evolution up to the relaxation onset are monitored during the