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이혁재 교수

Hyeok Jae Lee

서울대학교 · 공학

연구실 소개

이혁재 교수의 연구실은 반도체 소자 물리 및 고신뢰성 소자 설계를 핵심으로 하며, 특히 SOI(Silicon-on-Insulator) 기반 MOSFET의 소자 특성과 고장 메커니즘을 깊이 있게 분석하고 있습니다. 얕은 터널 고립(Shallow Trench Isolation, STI)이 소자 성능에 미치는 영향, 저주파 노이즈의 기원, 그리고 소자 크기와 게이트 구조에 따른 이동도 및 고장률 변화를 중심으로 연구를 진행하고 있습니다. 또한 고성능 이미지 처리 하드웨어 설계와 같은 응용 분야에서도 효율적인 하드웨어 아키텍처 설계에 기여하고 있습니다.

SOI 소자STI 영향저주파 노이즈소자 신뢰성하이브리드 하드웨어 설계

연구 현황

논문 수
34
총 인용 수
99
최근 5년 논문
12
주요 분야
공학

연구 성과 추이

표시된 성과는 수집된 데이터 기준으로 산출되며, 일부 차이가 있을 수 있습니다.

5개년 연도별 논문 게재 수
12총합
2019
2020
2021
2023
2025
5개년 연도별 피인용 수
13총합
20192020202120232025

주요 논문

15
1
논문|인용수 28·2002
An anomalous device degradation of SOI narrow width devices caused by STI edge influence
Hyeokjae Lee, Jong‐Ho Lee, Hyungsoon Shin, Young-June Park, Hong Shick Min
SJR Q2FWCI 1.4IEEE Transactions on Electron Devices

The effects of shallow trench isolation (STI) on silicon-on-insulator (SOI) devices are investigated for various device sizes with three different gate shapes. Both NMOSFETs and PMOSFETs with the channel region butted to the STI show a reduction in mobility (NMOSFETs and PMOSFETs) and an increase of low-frequency noise as the channel width is reduced. In comparison, the devices without the STI-butted channel region show much less variation in mobility for various channel widths. The degradation

Electrical and Electronic EngineeringEngineering
2
논문|인용수 11·2013
A novel hardware design for SIFT generation with reduced memory requirement
김응섭, 이혁재
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE

Scale Invariant Feature Transform (SIFT)generates image features widely used to match objectsin different images. Previous work on hardwarebasedSIFT implementation requires excessiveinternal memory and hardware logic [1]. In this paper,a new hardware organization is proposed toimplement SIFT with less memory and hardware costthan the previous work. To this end, a parallelGaussian filter bank is adopted to eliminate thebuffers that store intermediate results becauseparallel operations allow all i

3
논문|인용수 8·2001
Low-frequency noise degradation caused by STI interface effects in SOI-MOSFETs
Hyeokjae Lee, Jong‐Ho Lee, Hyungsoon Shin, Young June Park, Hong Shick Min
SJR Q1FWCI 1.3IEEE Electron Device Letters

The low-frequency noise characteristics of SOI MOSFETs with shallow trench isolation (STI) structure are investigated for various device sizes with three different gate shapes. Devices with channel region butted to the STI show an increase of low-frequency noise as the channel width is reduced. In comparison, the devices without the STI butted to the channel region show much less increase of noise power spectral density with channel width. From the charge pumping and noise measurement results, t

Electrical and Electronic EngineeringEngineering
4
논문|인용수 8·2010
Accuracy of a proposed implant impression technique using abutments and metal framework
이혁재, 임영준, 김창회, 최정한, 김명주
The Journal of Advanced of Prosthodontics

PURPOSE. This study compared the accuracy of an abutment-framework (A-F) taken with open tray impression technique combining cementon crown abutments, a metal framework and resin cement to closed tray and resin-splinted open tray impression techniques for the 3-implant definitive casts. The effect of angulation on the accuracy of these 3 techniques was also evaluated. MATERIAL AND METHODS. Three definitive casts, each with 3 linearly positioned implant analogs at relative angulations 0, 30, and

5
논문|인용수 6·2002
Characterization issues of gate geometry in multifinger structure for RF-SOI MOSFETs
Hyeokjae Lee, Jong-Ho Lee, Young June Park, Hong Shick Min
SJR Q1FWCI 0.7IEEE Electron Device Letters

In this letter, we propose that f/sub T/ and f/sub max/ properties in partially depleted SOI devices were analyzed in terms of gate electrode layout, body instability, and body resistance of multifinger structure. The speed characteristics were a strong function of the number of fingers and gate types such as T-gate and H-gate structures and were evaluated by g/sub m/ variation (/spl Delta/g/sub m/), extra parasitic capacitance (/spl Delta/C/sub gs/), and ac body instability.

Electrical and Electronic EngineeringEngineering
6
논문|인용수 5·2002
A new leakage component caused by the interaction of residual stress and the relative position of poly-Si gate at isolation edge
Hyeokjae Lee, Yoonjong Huh, Jung-Suk Goo, Sang-Don Lee, Dooyoung Yang, Wooshik Kim
FWCI 0.3

We report a new junction leakage generation phenomenon which was found at specific junction edges on top of which poly-Si gates ran nearby in a 0.35 /spl mu/m design rule actual DRAM chip. As more advanced isolation schemes that enabled less bird's beak were applied, the phenomenon was more evident. After characterizing a set of junction leakage patterns where the relative position of poly gate to the junction edge was systematically varied, a problematic combination of process window and design

Electrical and Electronic EngineeringEngineering
7
논문|인용수 4·2023
Evaluation of Neutron Radiation Impact for 1200-V Class 4H-SiC MOSFET at Gate Switching Mode With TCAD Simulation
Dongwoo Bae, Kiseog Kim, Hyeokjae Lee, Sung Soo Chung, Joongsik Kih, Seungjoo Woo, Chang‐Hee Cho, Saqib Khan, Changheon Yang, S.A. Wender, Youngboo Kim
SJR Q2FWCI 0.5IEEE Transactions on Nuclear Science

We evaluated and analyzed power silicon carbide (SiC) metal-oxide-semiconductor field-effect-transistors (MOSFETs) with gate switching mode during neutron irradiation with our commercial single event effect (SEE) analyzer. Based on evaluation and analysis, we found 1) difference of radiation robustness characteristics; 2) switching mode to be worse condition than non-switching (dc bias condition) mode for 1200-V-rated SiC MOSFETs; and 3) temperature dependence with three manufacturers’ SiC MOSFE

Electrical and Electronic EngineeringEngineering
8
논문|인용수 4·2006
Enhancing leakage suppression in carbon-rich silicon junctions
Chung Foong Tan, Eng Fong Chor, Hyeokjae Lee, Elgin Quek, Lap Chan
SJR Q1FWCI 0.4IEEE Electron Device Letters

Carbon-incorporated devices exhibit an increase in junction leakage relative to pure Si devices. The authors demonstrate that a leakage suppression of /spl sim/ 50 times can be achieved in carbon-rich (Si:C) junctions. This is accomplished by a prolonged annealing for 1 to 10 min at 850 /spl deg/C (much lower than typical annealing temperature of >1000/spl deg/C) and is attributed to a decrease in interstitial carbon concentration. After a 10-min annealing, the Si:C junctions display a leakage o

Electrical and Electronic EngineeringEngineering
9
논문|인용수 4·2002
Harmonic distortion due to narrow width effects in deep sub-micron SOI-CMOS device for analog-RF applications
Hyeokjae Lee, Kwun-Soo Chun, Jeong-Hyong Yi, Jong Ho Lee, Young June Park, Hong Shick Min
FWCI 0.3

The authors have investigated the reason for low-noise frequency degradation, frequency dispersion, and harmonic distortion in narrow width SOI MOSFETs with STI. As the channel width decreases, low-frequency noise characteristics, frequency dispersion and harmonic distortion deteriorate due to the larger influence of the interface state which is caused by interface roughness. They have also analyzed the unit circuits performance of VCO, RO, and single MOSFET amplifiers.

Electrical and Electronic EngineeringEngineering
10
논문|인용수 3·2020
An Accurate Weight Binarization Scheme for CNN Object Detectors with Two Scaling Factors
Xuan Truong Nguyen, Tuan Nghia Nguyen, 이혁재, Hyun Kim

Recently, convolutional neural network (CNN)-based object detectors such as You Only Look Once (YOLO) have been intensively studied for applications in robotics, drones, and autonomous driving. Although YOLO can run in real time by using a graphics processing unit, the YOLO hardware implementation has received a great deal of interest due to its power efficiency and the potential for massive chip production. However, extensive memory access and high computation complexity are widely known as bot

11
논문|인용수 3·2000
A dual body SOI structure for mixed analog-digital mode circuits
Hyeokjae Lee, Jong-Ho Lee, Young June Park, Hong Shick Min
SJR Q2FWCI 1.4IEEE Transactions on Electron Devices

A new silicon-on-insulator (SOI) structure for mixed analog-digital applications is proposed where analog and digital MOSFET's are independently optimized. Two types of field oxide are introduced so that the body bias of analog devices can be effectively controlled whereas the channel region for digital devices is fully depleted. From measurements of the body related device characteristics such as the output resistance, the variation of threshold voltage and transconductance, 1/f noise, body res

Electrical and Electronic EngineeringEngineering
12
논문|인용수 3·2002
Hot-carrier-induced gate capacitance variation and its impact on DRAM circuit functionality
Yoonjong Huh, Hyeokjae Lee, Jae-Gyung Ahn, Dooyoung Yang, Yung-Kwon Sung
FWCI 1.0

In this paper we detail the consequences of hot-carrier effects on gate capacitance variation and it's impact on the design margin of each constituent circuit of a 64 Mb DRAM. The degradation mechanism, which produces the capacitance imbalance in specific circuit blocks, is the combination of the increase of gate capacitance in PMOSFET, and the decrease of gate capacitance in NMOSFET. The two dimensional device simulation using MEDICI was also carried out to investigate the gate capacitance vari

Electrical and Electronic EngineeringEngineering
13
논문|인용수 3·2017
Super-Resolution을 위한 Deconvolution 적용 고속 컨볼루션 뉴럴 네트워크
이동현, 이호성, 이규중, 이혁재

In super-resolution, various methods with Convolutional Neural Network(CNN) have recently been proposed. CNN based methods provide much higher image quality than conventional methods. Especially, VDSR outperforms other CNN based methods in terms of image quality. However, it requires a high computational complexity which prevents real-time processing. In this paper, the method to apply a deconvolution layer to VDSR is proposed to reduce computational complexity. Compared to original VDSR, the pr

14
논문|인용수 2·2021
목표물 신호 모니터링 및 SPGD 알고리즘 기반 3 채널 타일형 결맞음 빔결합 시스템 연구
김영찬, 윤영선, 김한솔, 장한별, 박재덕, 최윤진, 나정균, 이주한, 강현구, 여민수, 최규홍, 노영철

단일 레이저의 출력 한계를 뛰어넘기 위한 빔결합 방법으로서, 보강간섭 원리를 이용한 타일형 결맞음 빔결합 시스템에 대해 연구하였다. 와트급 출력의 3 채널 결맞음 광섬유 레이저 및 삼각형 배치의 팁-틸트(tip-tilt) 기능을 갖춘 3 채널 출력단을 자체제작 하였다. 모니터링 시스템, 위상제어기, 3 채널 위상변조기 간의 궤환 제어 시스템(closed-loop system)을 구성하고 SPGD 알고리즘을 적용하여, 위상잠금 속도 5~67 kHz, 이상적인 계산값 대비 중심부 광세기 효율 53.3%의 성공적인 3 채널 위상잠금을 구현하였다. 빔결합 소자가 필요 없고, 가장 고출력 가능성을 가진 타일형 결맞음 빔결합을 위한 요소기술 개발이 완료되어, 향후 다채널, 고출력, 고속 제어 연구로 이어질 수 있을 것으로 기대된다.

15
논문|인용수 1·2004
Error Concealment Based on Semantic Prioritization with Hardware-Based Face Tracking
이혁재, Jae-Beom Lee, Ju-Hyun Park, Woo-Chan Lee

With video compression standards such as MPEG-4, a transmission error happens in a video-packet basis, rather than in a macroblock basis. In this context, we propose a semantic error prioritization method that determines the size of a video packet based on the importance of its contents. A video packet length is made to be short for an important area such as a facial area in order to reduce the possibility of error accumulation. To facilitate the semantic error prioritization, an efficient hardw

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Electrical and Electronic Engineering

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