Eung-Rae Kim
Hanyang University · 工学
研究室紹介
Professor Eung-Rae Kim's research lab specializes in the design and synthesis of functional organic and hybrid materials for advanced optoelectronic and data storage applications. Key research directions include the development of π-conjugated polymers for light-emitting devices, azo dyes and their metal complexes for high-performance DVD-R recording media, and thin films for transparent conductive electrodes in flat panel displays. The lab also investigates nano- and micro-fabrication techniques such as atomic force microscope lithography and chemically amplified resists for next-generation semiconductor patterning.
Research Overview
Research Output Trend
Figures are computed from collected data and may differ slightly.
Selected Papers
15Soluble π-conjugated polythiophene derivatives containing the electron-transporting moiety were synthesized through FeCl 3 -oxidative polymerization; poly(3-(2-benzotriazoloethyl)thiophene) (PBET) and poly(3-(2-(5-chlorobenzotriazolo)ethyl)thiophene) (PCBET). The structure of the polymers was verified by FT-IR, 1 H NMR, and element analysis. Introduction of the electron-transporting moiety, benzotriazole, on the side chain in poly(3-alkylthiophene) was an attempt to balance the injection rates o
Abstract Four kinds of azo dyes and their metal-azo dyes were synthesized in order to obtain a high reflective index and better thermal stability as a recording material for DVD-R. Several kinds of novel azo dyes based on benzoic acid, 6-methoxybenzothiazole, benzothiazole-6-carboxylic acid, and benzimidazole have been synthesized. These azo dyes reacted with metal ions, such as Ni2+, Cu2+, Zn2+, and Co2+, as ligands. All structures of the compounds were confirmed by 1H-NMR and FT-IR analyses. T
A thin film of tin oxide (SnO2) was prepared on a plastic substrate by DC magnetron roll sputtering. The deposition thickness of SnO2 rapidly decreased with the increase of O2 gas flow rate, even though the refractive index remained almost constant at the level of 2.0 after the flow rate exceeded 40 sccm. The SnO2 thin film was applied as the oxide layer of the inner side of the multilayer conductive electrode having the sandwich structure of the oxide/metal/oxide system for flat panel display (
Atomic force microscope lithography on organic resist films has been studied for fabricating nanostructures. Mixed self-assembled monolayers (SAMs) of 1,12-diaminododecane·dihydrochloride (DAD·2HCl) and n -tridecylamine·hydrochloride (TDA·HCl) were fabricated on Si substrates in order to investigate the effect of terminal surface groups of SAM resist films on the efficacy of anodic patterning of silicon wafers using atomic force microscope lithography. The compositions of both charged quaternary
A new positive chemically amplified resist which consists of novel methacrylate terpolymer with bis(trimethylsilyl)isopropyl group and a photoacid generator has been developed for ArF excimer laser photoresists. The polymer structure and properties was evaluated by 1H-NMR, UV, FT-JR. DSC, TGA and GPC. This new terpolymer demonstrates good thermal stability up to 135°C, good dry-etching resistance, high transparency (75%) for a ArF excimer laser exposure. Preliminary line and space patterns were
Abstract We have synthesized 5-(diethylamino)-2-[(E)-2-(methoxy-1, 3-benzo thiazole)-1-diazenyl] phenol (DMBTA) azo and DMBTA complexed with Ni, Cu, and Zn for DVD-R fabrication. The structures of the products were characterized by 1H-NMR and FT-IR. The properties of the compounds required for DVD-R fabrication were elucidated by UV-VIS and TGA. From the UV-VIS data, Zn-DMBTA exhibited the best response with 635 nm generally used in a DVD player. Based on the analysis of TGA data, it showed high
We have synthesized polyaniline (PANI) particles in amphiphilic copolymer micelles. These associative copolymers, hydrophobically endcapped polyurethane resins (HEURs), aggregate in "flower-type" micelles at low concentration and used as a nanoreactor. The prepared PANI particles are "donut-like" shape, and have the typical peaks of UV-vis and FT-IR in emeraldine base (EB) form.
Two new positive-type photoresists which are terpolymers of methyl methacrylate (MMA), 1,3-bis(trimethylsilyl)isopropyl methacrylate (BPMA) and either methacrylic acid (MAA) or maleic anhydride (MA) have been synthesized for ArF excimer laser lithography. Terpolymers have a silicon containing acid labile protecting group which can be deprotected by photo acid generator (PAG). Terpolymers have a good thermal stability up to 140°C and the glass transition temperature ( T g ) of poly(MMA x -BPMA y
Abstract Self-assembled fullerene-diaminoaodecane multilayer films were prepared on planar silicon wafer and quartz plate and on nonplanar fumed silica surfaces, and the growth of each layer and its uniformity was charackrized by using FTIR, UV, contact angle measurement and ellipsometric measurement. It is suggested that fullerene-diaminododecane layers are not completely packed on oxide surfaces, but the growrh of each layer was confirmed.
Abstract A multilayer polymer thin film electroluminescence (EL) device has been prepared by fully using the LB film method. We synthesized a novel polythiophene derivative poly-3-(2-(5-chlorobenzotriazole)ethyl)thiophene (PCBET) and studied the EL effect of LB LEDs PCBET as the emitting materials. The PL spectra of polymer shows a peak at around 605 nm, which is about 65 nm blue shifted compared with poly 3-decylthiophene results from the benzotrizole group.
톨루엔, 자일렌 등 유기 용매에 녹는 에머랄딘 염 형태의 폴리아닐린-도데실벤젠술폰산 (PANI-DBSA)이 한 단계 마이셀 유화 중합법에 의해 제조되었다. 유기 양성자산으로 DBSA가 사용되었으며, DBSA와 아닐린 단량체의 비율이 1.5:1의 중합 조건에서 용해도 및 전기적 특성이 가장 우수하였고, 이때 제조한 PANI-DBSA의 톨루엔에서 용해도는 8 wt% 정도이다. 이들은 유리 또는 플라스틱 필름 기판 위에 도포되어 필름 형상으로 얻어지며, 폴리우레탄 또는 폴리스티렌 등과도 쉽게 혼합되었다. 5 S/cm 이상의 전기전도도와 500 nm 이하의 필름두께에서 70% 이상의 가시광선 투과도를 보이며, 필름의 표면상태가 수용액에서의 유화 중합법에 의해 제조되는 PANI-DBSA보다 매우 균일함을 AFM을 통해 관찰하였다. 반응생성물의 대부분은 톨루엔 용매에 용해되었지만 용해되지 않은 일부 PANI-DBSA은 50∼400 nm 크기의 입자로 유기 용매에 분산되어 있음이 확인되었고 이들