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Jongyeol Ahn

Sungkyunkwan University

研究室紹介

Professor Jongyeol Ahn's research lab specializes in the epitaxial growth and fundamental characterization of two-dimensional materials, particularly graphene and hexagonal boron nitride (h-BN), on semiconductor substrates such as SiC and Si. The lab focuses on controlling the atomic-scale interface structures during heteroepitaxial growth, enabling the synthesis of high-quality, transfer-free 2D heterostructures with tailored electronic and structural properties. Key research directions include the development of novel buffer layers—such as amorphous boron-nitrogen interlayers—and the exploration of quasicrystalline graphene phases via twist-angle engineering. The lab employs advanced surface science techniques, including low-energy electron diffraction, angle-resolved photoemission spectroscopy, and X-ray photoelectron spectroscopy, to probe interfacial electronic structures at the atomic level.

2D materialsepitaxial growthgraphene heterostructuresinterface engineeringsurface science

Research Overview

Papers
2
Total Citations
3
Papers (5y)
2
Primary Field

Research Output Trend

Figures are computed from collected data and may differ slightly.

Publications per year (5y)
2total
2025
2026
Citations per year (5y)
3total
20252026

Selected Papers

2
1
Article|3 citations·2025
Synthesis of multilayer graphene on an atomically thin SiON layer grown on a SiC substrate
김범주, Kim Jin Wook, Choi Kyu Hwa, Park Gun Woo, Im Seing Hyum, Kim Do Hyun, Sin Sung Hoo, 이도희, Choi Jun-Hui, Lee Jae-Hyun, 안종열

Multilayer graphene was synthesized on an atomically thin silicon oxynitride (SiON) layer. This SiON layer was itself grown on a SiC(0001) wafer. The number of graphene layers was approximately controlled through the manipulation of argon partial pressure and exposure time. Both SiC and Si wafers are standard and commercially available substrates in the semiconductor industry, underscoring the importance of growing graphene layers on these wafers without the need for a transfer process. The mult

2
Article|0 citations·2026
Revisiting the interfacial structure of graphene quasicrystal growth on SiC
임성현, 박건우, Kim Do Hyun, Lee Do Hee, Lee Wonhui, Kim Namryeol, Choi Kyu Hwa, 안종열

We revisit the interfacial structure underlying the growth of graphene quasicrystals on SiC, previously realized by a twisted bilayer graphene with a twist angle of 30°. While the formation of graphene quasicrystals via an h-BN-mediated growth process has been established, the microscopic nature of the interface between the overlayer and the SiC substrate has remained unclear. Using a combination of low-energy electron diffraction, angle-resolved photoemission spectroscopy, and core-level X-ray

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