Jss6456
Korea Advanced Institute of Science and Technology · 工学
研究室紹介
Professor Jss6456's research lab specializes in advanced magnetic and microfabrication technologies, focusing on the design and optimization of permanent magnet linear actuators for high-efficiency electromechanical systems. The lab also conducts cutting-edge research in plasma etching processes for high-aspect-ratio semiconductor device fabrication, particularly in selective SiO2 etching and sidewall profile control. Additionally, the lab explores materials and device physics related to magnetic tunnel junctions and MgO-based barriers for next-generation magnetic random access memory (MRAM) applications.
Research Overview
Research Output Trend
Figures are computed from collected data and may differ slightly.
Selected Papers
10Permanent magnet (PM)-type linear oscillating actuators (LOAs) are used in various types of equipment owing to their high efficiency, thrust density, and good control performance. However, the disadvantage of the LOA is the side force inevitably generated by the magnetic coupling structure of the stator and the PM mover. Therefore, side force reduction is essential at the design stage. This study manages the optimal side force design of a movable PM-type linear actuator using response surface me
A new periodic two-step process composing SiO2 etching with high bias radio frequency (rf) power and fluorocarbon deposition with low bias rf power was studied for the highly selective etching of SiO2 to photoresist (PR). In this experiment, the time scale of each step is longer than the conventional time-modulation technique in order to maximize the protection layer on PR and prevent the etch stop. Many works have focused on the gaseous chemical species especially CF2 radicals for selective sur
Abrupt changes in sidewall profile were induced in pulsed plasma etch process for high aspect ratio isolation trench structuring. Impacts of operational parameters when applying pulsed RF bias power were investigated. Silicon sidewall chipping problems were removed mainly by increasing bias power level and pulse frequency. The chemical sensitivity of O2 has shown decreased in extremely narrow trench spaces of high pattern density
Magnetic Random Access Memory (MRAM) has emerged as the leading candidate for future universal memory due to its non-volatility, excellent endurance and read/write performance. The magnetic tunnel junction (MTJ) is a data storage element in MRAM and is basically composed of two ferromagnetic layers separated by the magnesium oxide (MgO) tunnel barrier. MgO between two ferromagnetic layers was adopted to enlarge the resistance difference between two kinds of magnetic arrangements by tunneling cur
Abstract not Available.
Abstract not Available.