Seung-Yup Lee
Seoul National University · 材料科学
研究室紹介
Professor Seung-Yup Lee's research lab specializes in advanced materials science, focusing on the design and fabrication of functional polyelectrolyte multilayers and nanostructured materials using scalable deposition techniques such as spin-coating and layer-by-layer assembly. The lab investigates the influence of molecular parameters—like molecular weight and charge density—on thin film formation and surface properties, with applications in sensors, coatings, and biomaterials. Additionally, the lab employs atomistic simulations, particularly molecular dynamics, to understand nanoscale deformation mechanisms in nano-lithography and mechanical processing of materials such as copper and diamond-like systems. Their interdisciplinary work bridges polymer chemistry, surface science, and nanofabrication for next-generation micro- and nano-devices.
Research Overview
Research Output Trend
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Selected Papers
3ADVERTISEMENT RETURN TO ISSUEPREVCommunication to the...Communication to the EditorNEXTLayer-by-Layer Deposited Multilayer Assemblies of Ionene-Type Polyelectrolytes Based on the Spin-Coating MethodSeung-Sub Lee, Jong-Dal Hong, Chang Hwan Kim, Kwan Kim, Ja Pil Koo, and Ki-Bong LeeView Author Information Department of Chemistry, University of Inchon, 177 Dohwa-dong Nam-gu, Inchon 402-749, Korea Division of Chemistry and Molecular Engineering and Center for Molecular Catalysis, Seoul National Univ
The influence of molecular mass on the formation of polyelectrolyte multilayers on an oppositely charged surface of a rotating substrate was explored for a combination of strong cationic and anionic polyelectrolytes, such as poly(1-( N -benzylpyridinio-2-yl)ethylene bromide) (PVP-2B) and ι-carrageenan. UV/visible spectroscopy and ellipsometry measurements confirmed that the amount of material deposited on a substrate is inversely proportional to the logarithm of the molecular weight of PVP-2B at
The atomic force microscopy (AFM) based lithographic technique has been used directly to machine material surface and fabricate nano components in MEMS (micro electro mechanical system). In this paper, three-dimensional molecular dynamics (MD) simulations have been conducted to evaluate the characteristic of deformation process at atomistic scale for nano-lithography process. Effects of specific combinations of crystal orientations and cutting directions on the nature of atomistic deformation we