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We fabricate high-performance, flexible, transparent electrochromic (EC) films and thin film heaters (TFHs) on an ITO/Cu/ITO (ICI) multilayer electrode prepared by continuous roll-to-roll (RTR) sputtering of ITO and Cu targets. The RTR-sputtered ICI multilayer on a 700 mm wide PET substrate at room temperature exhibits a sheet resistance of 11.8 Ω/square and optical transmittance of 73.9%, which are acceptable for the fabrication of flexible and transparent EC films and TFHs. The effect of the C

We report on plasma damage-free sputtering of an indium tin oxide (ITO) cathode layer, which was grown by a mirror shape target sputtering (MSTS) technique, for use in top-emitting organic light-emitting diodes (TOLEDs). It is shown that OLEDs with ITO cathodes deposited by MSTS show much lower leakage current (9.2×10−5mA∕cm2) at reverse bias of −6V as compared to that (1×10−1–10−2mA∕cm2 at −6V) of OLEDs with ITO cathodes grown by conventional dc magnetron sputtering. Based on high-resolution el

We report on low-resistance ohmic contacts to the moderately doped n-type ZnO:Al(nd=2×1017 cm−3) obtained using Ti (30 nm)/Au (50 nm) metallization schemes. Annealed Ti/Au contacts exhibit linear current–voltage characteristics, showing that high-quality ohmic contacts are formed. The Ti/Au scheme produces a specific contact resistance of 2×10−4 Ω cm2 when annealed at 300 °C for 1 min in a N2 atmosphere.

We have investigated nonalloyed Al/Pt ohmic contacts on n-type ZnO:Al (nd=2.0×1018 cm−3). It is shown that the as-deposited Al/Pt contacts produce a specific contact resistivity of 1.2×10−5 Ω cm2. Auger electron spectroscopy and x-ray photoelectron spectroscopy depth profile results show interdiffusion between oxygen and aluminum, resulting in an increase of carrier concentrations near the ZnO surface. The increase of the carrier concentration at the surface region of ZnO is attributed to the lo