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신형철 교수

Hyungchul Shin

서울대학교 전기·정보공학부 · 공학

연구실 소개

신형철 교수의 연구실은 반도체 소자 및 나노전자소자의 핵심 성능과 신뢰성 문제를 다루며, 특히 초미세 공정에서 나타나는 노이즈, 플라즈마 충전 손상, 트랩 상태의 영향 등에 대한 정량적 분석과 모델링에 중점을 두고 있습니다. 고도로 통합된 반도체 소자에서 발생하는 열노이즈, 랜덤 텔레그래프 노이즈, 그리고 수명 예측에 영향을 미치는 활성화 에너지의 이질적 거동에 대한 기초 연구를 진행하고 있으며, 향후 20nm 이하의 메모리 및 전계효과트랜지스터 설계에 필수적인 기초 데이터를 제공합니다. 특히, 실용적 응용과 이론적 모델링의 융합을 통해 신뢰성 있는 반도체 소자 개발에 기여하고자 합니다.

노이즈 모델링플라즈마 손상수명 예측트랩 상태초미세 공정

연구 현황

논문 수
403
총 인용 수
3,246
최근 5년 논문
31
주요 분야
공학

연구 성과 추이

표시된 성과는 수집된 데이터 기준으로 산출되며, 일부 차이가 있을 수 있습니다.

5개년 연도별 논문 게재 수
31총합
2022
2023
2024
2025
2026
5개년 연도별 피인용 수
115총합
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주요 논문

15
1
논문|인용수 43·2013
A 55dB SNR with 240Hz frame scan rate mutual capacitor 30×24 touch-screen panel read-out IC using code-division multiple sensing technique
Hyungcheol Shin, Seung Hoon Ko, Hongjae Jang, Ilhyun Yun, Kwyro Lee

Capacitive touch-screen technology introduces new concepts to user interfaces, such as multi-touch, pinch zoom-in/out gestures, thus expanding the smartphone market. However, capacitive touch-screen technology still suffers from performance degradation like a low frame scan rate and poor accuracy, etc. One of the key performance factors is the immunity to external noise, which intrudes randomly into the touch-screen system. HUM, display noise, and SMPS are such noise sources. The main electrical

Electrical and Electronic EngineeringEngineering
2
논문|인용수 29·2002
Impact of plasma charging damage and diode protection on scaled thin oxide
Hyungcheol Shin, Zhi-Jian Ma, Chenming Hu

The plasma charging stress can be quantified sensitively using differential pair circuits as well as MOSFETs. We have developed a quantitative model for thin oxide plasma charging damage by examining the oxide thickness dependence of charging current. The model predicts the oxide thickness dependence of plasma charging successfully. A quantitative model of protection diodes for wafer charging effect on future thinner oxides is also presented.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML"

Electrical and Electronic EngineeringEngineering
3
논문|인용수 19·2017
Investigation and analysis of dual-k spacer with different materials and spacer lengths for nanowire-FET performance
Hyungwoo Ko, Jongsu Kim, Myounggon Kang, Hyungcheol Shin
SJR Q3Solid-State Electronics
Electrical and Electronic EngineeringEngineering
4
논문|인용수 19·2006
Analytical Thermal Noise Model of Deep-submicron MOSFETs
Hyungcheol Shin, Seyoung Kim, Jongwook Jeon
SJR Q3JSTS Journal of Semiconductor Technology and Science

This paper presents an analytical noise model for the drain thermal noise, the induced gate noise, and their correlation coefficient in deep-submicron MOSFETs, which is valid in both linear region and saturation region. The impedance field method was used to calculate the external drain thermal noise current. The effect of channel length modulation was included in the analytical equation. The noise behavior of MOSFETs with decreasing channel length was successfully predicted from our model.

Electrical and Electronic EngineeringEngineering
5
논문|인용수 12·2017
Comparison of dual- k spacer and single- k spacer for single NWFET and 3-stack NWFET
Hyungwoo Ko, Jongsu Kim, Min‐Soo Kim, Myounggon Kang, Hyungcheol Shin
SJR Q3Solid-State Electronics
Electrical and Electronic EngineeringEngineering
7
논문|인용수 12·2002
이상(李箱) 시에 나타난 ‘시선(視線)’의 정치학과 ‘거울’의 주체론 연구
신형철

이상의 '아해'는 식민통치와 공모하고 있는 오이디푸스적 권력의 사생아들이다. 혹은 그 권력의 날카로운 반영이다. 그리고 이에 대한 이상의 전략은 사회적·가족적 재생산을 담당하는 어른이 되기를 포기하는 것이다. 노동하지 않고, 섹스하지 않는 주체, 즉 '무기체 되기'.그러나 이상의 보다 적극적인 전략은 유기체에서 무기체로의 전신(轉身)에 있는 것이 아니다. 이상의 가장 독창적인, 그리고 가장 문학적인 전략은 다름 아니라 이상의 '발명', 자연인 김해경에서 문학인 이상으로의 탈출이다. 이는 단지 김해경이 '李箱'이라는 필명을 사용했다는 차원의 이야기가 아니다. 이상은 '李箱'이라는 이름으로 완전히 다른 삶을 도모했었다. 텍스트에서 '이상'이라는 이름을 노출시키면서 그가 겨냥했던 것은, 그 조각조각 나뉘어진 텍스트(text)들을 모아서 말 그대로 하나의 직물(texture)을 짜는 것이었다. 그것은 '이상'이라는 '텍스트'를 만들어, '이상'이라는 '삶'을 구성하는 작업이다. '이상'이라

8
논문|인용수 9·2017
GIDL analysis of the process variation effect in gate-all-around nanowire FET
Shin-Keun Kim, Youngsoo Seo, Jangkyu Lee, Myounggon Kang, Hyungcheol Shin
SJR Q3Solid-State Electronics
Electrical and Electronic EngineeringEngineering
9
논문|인용수 6·2015
Modeling of apparent activation energy and lifetime estimation in NAND flash memory
Kyunghwan Lee, Myounggon Kang, Yuchul Hwang, Hyungcheol Shin
SJR Q2Semiconductor Science and Technology

Misunderstanding apparent activation energy ( E aa ) can cause serious error in lifetime predictions. In this paper, the E aa is investigated for sub 20 nm NAND flash memory. In a high-temperature (HT) regime, the interface trap ( N it ) recovery mechanism has the greatest impact on the charge loss. However, the values of E aa and E a (Nit) have a wide difference. Also, the lifetime of the device cannot be estimated by the Arrhenius model due to the E aa roll-off behavior. For the first time, we

Electrical and Electronic EngineeringEngineering
10
논문|인용수 5·2010
Characterization of oxide traps by RTN measurement in MOSFETs and memory devices
Hyungcheol Shin, Byoungchan Oh

Random telegraph noise (RTN) in various devices such as nano-wire, recessed-channel and high-k FET has been studied through various measurement techniques and analysis. By taking into account both effects which are variation of surface potential and poly depletion voltage drop, we proposed a new method for extracting both locations (x <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</inf> , y <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmln

Electrical and Electronic EngineeringEngineering
11
논문|인용수 5·2017
Analysis of Self-Heating Effects on vertical FET according to Shallow Trench Isolation
Ilho Myeong, Dokyun Son, Hyunsuk Kim, Myounggon Kang, Hyungcheol Shin
SJR Q3Solid-State Electronics
Electrical and Electronic EngineeringEngineering
12
논문|인용수 4·1997
Overestimation of oxide defects density in large test capacitors due to plasma processing
Hyungcheol Shin, Minkyu Je, Chenming Hu
SJR Q2IEEE Transactions on Electron Devices

Oxide shorts density obtained from large test capacitors is found to be higher than that in a multiple of separated small capacitors having the same total oxide area. The observed difference in failure rate is explained by the different oxide charging currents for the weak spots in the two devices during plasma processing. This experiment can explain the observed lower density of shorts after plasma processing in ICs, which is composed of many small devices, than in test structures which are lar

Electrical and Electronic EngineeringEngineering
13
논문|인용수 2·2006
Active and Passive RF Device Compact Modeling in CMOS Technoloies
Hyungcheol Shin, In Man Kang, Jong Wook Jeon, Joonho Gil

A new method for extracting pi-type substrate resistance model of RF MOSFETs based on 3-port measurement is presented. Using NQS and macro-model with extracted substrate components, it is verified that the new substrate resistance model is accurate. Also, temperature dependent macro model is developed. An analytical high frequency thermal noise model for short-channel MOSFETs which covers all operating regions is developed. A simple wide-band model for on-chip inductors on silicon is presented.

Electrical and Electronic EngineeringEngineering
14
논문|인용수 2·2015
Characterizing traps causing random telegraph noise during trap-assisted tunneling gate-induced drain leakage
Sungwon Yoo, Joonha Shin, Youngsoo Seo, Hyun‐Suk Kim, Sangbin Jeon, Hyunsoo Kim, Hyungcheol Shin
SJR Q3Solid-State Electronics
Electrical and Electronic EngineeringEngineering
15
논문|인용수 1·2024
Program Start Bias Grouping to Compensate for the Geometric Property of a String in 3-D NAND Flash Memory
Sungju Kim, Sangmin Ahn, Sechun Park, Jongwoo Kim, Hyungcheol Shin
SJR Q2IEEE Journal of the Electron Devices SocietyOA

The string (STR) with various geometrical profiles in 3-D NAND flash cause the degradation of program efficiency. This is because the program speed differences among WL layers within the STR are caused by the geometrical properties observed through measurement results. In this work, we propose the method to reduce the program speed differences based on a word-line (WL) grouping in terms of threshold voltage (Vth) distribution to compensate for the program start voltage (Vstart). To address vario

Computer Networks and CommunicationsComputer Science

대표 연구 분야

Electrical and Electronic EngineeringComputer Networks and CommunicationsAtomic and Molecular Physics, and OpticsMaterials ChemistryBiomedical EngineeringMechanical Engineering

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