이인환 교수
In‐Hwan Lee
고려대학교 신소재공학부 · 물리·천문학
연구실 소개
이인환 교수의 연구실은 전자 및 광전자 소자에서 핵심적인 역할을 하는 nitride 계 반도체(GaN, ZnO)와 산화물 반도체(SnO₂)의 에피택셜 성장 및 물성 제어를 중심으로 연구를 진행하고 있습니다. 특히 Si 도핑에 의한 잔류 스트레스 완화와 광학적 특성 변화, 나노구조를 활용한 고감도 광학 센서 및 태양전지의 효율 향상 기술 개발에 초점을 맞추고 있습니다. 또한, 나노소재 기반의 광촉매 및 표면 증강 라만 분광법(SERS) 기반의 초민감 검출 기술도 함께 개발하고 있습니다.
연구 현황
연구 성과 추이
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주요 논문
15We report a systematic study accomplished with a series of undoped and Si-doped GaN epilayers grown on sapphire (0001) with the carrier concentration of 4.0×1017−1.6×1019 cm−3 in order to investigate the evolution of stress relaxation and yellow luminescence by Si incorporation. As the Si doping becomes higher, the bound exciton peaks are gradually shifted to lower energy due to relaxation of the thermal residual stress with the linear coefficient of ΔE/Δσ∥=42 meV/GPa. The present results show t
SnO 2 recently has attracted particular attention as a powerful buffer layer for organic optoelectronic devices due to its outstanding properties such as high electron mobility, suitable band alignment, and high optical transparency. Here, we report on facile low-temperature solution-processed SnO 2 nanoparticles (NPs) in applications for a cathode buffer layer (CBL) of inverted organic solar cells (iOSCs). The conduction band energy of SnO 2 NPs estimated by ultraviolet photoelectron spectrosco
We investigate the optical properties of two sets of Si-doped GaN epitaxial layers with different degree of compensation. The electron concentration dependence of the band-gap energy measured by photoluminescence is interpreted as band-gap narrowing effect and evaluated by a simple relation. The photoluminescence peak positions of heavily compensated samples are shifted downward with respect to those of moderately compensated samples, and the down shift becomes larger at higher electron density.
We report the Si-doping-induced relaxation of residual stress in GaN epitaxial layers grown on (0001) sapphire substrate by the metalorganic vapor phase epitaxy technique. Micro-Raman spectroscopy is used to assess stress situation in the films with systematically modulated doping concentration from 4.0×1017 up to 1.6×1019 cm−3. As the Si-doping concentration increases, a monotonic decrease of the E2 phonon frequency is observed, which signifies gradual relaxation of the stress in the film. The
An N-doped ZnO photocatalyst decorated with carbon quantum dots and active under irradiation with daylight was developed for the degradation of dyes in industrial wastewaters.
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